Explores anisotropic etching of organic films and Al alloys, emphasizing the role of Al2O3 in Al etching and presenting examples of dry etching processes.
Explores sheath formation, plasma etching, ion velocity, and energy in industrial plasmas, emphasizing their significance for modern electronics manufacturing.
Covers wet etching of sacrificial layers in micro and nanofabrication, including challenges and solutions for microstructure deformation and stress diagnosis.