Explores sheath formation, plasma etching, ion velocity, and energy in industrial plasmas, emphasizing their significance for modern electronics manufacturing.
Explores anisotropic etching of organic films and Al alloys, emphasizing the role of Al2O3 in Al etching and presenting examples of dry etching processes.
Explores the fabrication of thin film devices for BCI, covering interconnect resistance, microfabrication, encapsulation materials, and Parylene coatings.