Skip to main content
Graph
Search
fr
en
Login
Search
All
Categories
Concepts
Courses
Lectures
MOOCs
People
Practice
Publications
Startups
Units
Show all results for
Home
Lecture
Thin-Film Processing: Plasma Deposition
Graph Chatbot
Related lectures (32)
Sputtering: Film Growth and Control Parameters
Covers the sputtering process, parameters influencing film quality, and advantages over thermal evaporation.
Stress in Thin Films: Film Growth and Microfabrication
Examines stress in thin films, including uniform distribution and intrinsic factors, within the context of microfabrication.
Thin Films: Deposition and Patterning
Explores thin film preparation, growth mechanisms, and patterning techniques for organic electronic devices.
Thin Films: Growth and Interfaces
Explores dislocation motion, thin film growth models, and interface nature in modern technology.
Thin-Film Processing: Removal and Deposition
Explores thin-film removal and deposition techniques in CMOS technology, covering wet etching, dry etching, chemical mechanical polishing, and thin-film deposition methods.
Chemical Vapour Deposition Basics
Introduces the basics of Chemical Vapour Deposition, covering gas flow, pressure, and film growth kinetics.
Large Area Electronic Materials: Introduction
Introduces large area electronic materials, discussing benefits, driving forces, TCOs, applications, and challenges.
Crystalline Silicon Absorption
Explores the properties of crystalline silicon absorbers in solar cells, discussing absorption coefficients, dispersion effects, and absorption mechanisms in semiconductors.
Sputtering in CMi
Covers the operation of a cluster sputtering tool and the process of changing sputter targets.
Micro and Nanofabrication for Optomechanics
Explores the importance of micro- and nanofabrication in optomechanics, covering key processes and challenges in device fabrication.
Ceramic Processing: Powders & Pieces
Explores ceramic pieces, powders, forming methods, thin films, and surfactants.
Sputtering: Ion Target Interactions
Examines ion-target interactions in PVD sputtering processes, covering compound deposition, surface damage, and factors influencing target ejection rates.
Previous
Page 2 of 2
Next