Covers the process of etching using wet and dry techniques, explaining definitions, steps, examples, challenges, and solutions.
Explores the limitations of ohmic heating in plasma and the advantages and drawbacks of neutral beam injection for additional plasma heating.
Explores dry etching techniques in semiconductor processing, from barrel reactors to modern plasma sources like ICP and ECR.
Explores dry etching techniques for different materials, including continuous, pulsed, cryogenic processes, and isotropic etching using SF6.
Explores silicon etching techniques, fabrication of the Utah array, impedance measurements, and active silicon probes for neural recordings.
Introduces ion beam etchers, combining physical sputtering with chemical activity.
Explores etch stop techniques, including B implantation, electrochemical etch stops, and bulk micromachining examples in micro and nanofabrication.
