Skip to main content

Search

Show all results for

Home

Person

Andreas Vetter

This person is no longer with EPFL

About
Privacy
Disclaimer

Copyright © 2026 EPFL, all rights reserved

Graph Chatbot

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Related publications (10)

Please note that this is not a complete list of this person’s publications. It includes only semantically relevant works. For a full list, please refer to Infoscience.

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Wilfried Noell, Toralf Scharf, Chen Yan, Raoul Kirner, Andreas Vetter

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

High-resolution interference microscopy with spectral resolution for the characterization of individual particles and self-assembled meta-atoms

Toralf Scharf, Michail Symeonidis, Andreas Vetter

We apply a high-resolution interference microscope with spectral resolution to investigate the scattering response of isolated meta-atoms in real space. The final meta-atoms consist of core-shell clusters that are fabricated using a bottom-up approach. The ...

2019

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Wilfried Noell, Toralf Scharf, Raoul Kirner, Andreas Vetter

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018