Publication

Nucleation of ordered Fe islands on Al2O3/Ni3Al(111)

Harald Brune, Stefano Rusponi, Anne Lehnert, Régis Decker
2006
Journal Articles

Abstract

Scanning tunneling microscopy (STM) has been used to investigate the nucleation and stability of iron clusters on the Al2O3/Ni3Al (111) surface as a function of coverage and annealing temperature. We show that atomic beam deposition of iron leads to hexagonally ordered cluster arrangements with a distance of 24 angstrom between the clusters evidencing the template effect of the alumina film. The shape of the iron clusters is two-dimensional (2D) at deposition temperatures from 130 K to 160 K and three-dimensional (3D) at 300 K. However, the 2D iron clusters grown between 130 K and 160 K are stable up to 350 K. (c) 2006 Elsevier B.V. All rights reserved.

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https://infoscience.epfl.ch/entities/publication/3780ca2a-00f9-4764-b9fc-430c88d5ec47

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Harald Brune, Stefano Rusponi, Anne Lehnert, Régis Decker
2006
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/3780ca2a-00f9-4764-b9fc-430c88d5ec47

About this result

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Pulsed laser deposition

Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.

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Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

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