Publication

UV-induced index changes in undoped fluoride glass

Theo Lasser, Hans Georg Limberger, Marcel Zeller
2005
Journal Articles

Abstract

Undoped fluoride glass slides have been exposed to pulsed 193-nm ultraviolet (UV) irradiation. Their absorption changes have been measured to evaluate UV-induced index changes using Kramers-Kronig relation. A layer-peeling polishing technique was applied to characterize the local UV-induced index change of highly absorbing glass. Index changes up to 1.75 x 10(-4) have been evaluated with this method in fluorozirco-aluminate glass. Fluoroaluminate and fluorozirconate glass showed only small index changes of about 2.0 x 10(-6) and 2.6 x 10(-6) at a wavelength of 1550 nm.

Official source

https://infoscience.epfl.ch/entities/publication/4436c2db-9fe4-420b-a7bf-eeb6070863ac

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Theo Lasser, Hans Georg Limberger, Marcel Zeller
2005
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/4436c2db-9fe4-420b-a7bf-eeb6070863ac

About this result

Related concepts (11)

Ultraviolet

Ultraviolet (UV) is a form of electromagnetic radiation with wavelength shorter than that of visible light, but longer than X-rays. UV radiation is present in sunlight, and constitutes about 10% of the total electromagnetic radiation output from the Sun. It is also produced by electric arcs; Cherenkov radiation; and specialized lights; such as mercury-vapor lamps, tanning lamps, and black lights. Although long-wavelength ultraviolet is not considered an ionizing radiation because its photons lack the energy to ionize atoms, it can cause chemical reactions and causes many substances to glow or fluoresce.

Index fund

An index fund (also index tracker) is a mutual fund or exchange-traded fund (ETF) designed to follow certain preset rules so that the fund can replicate the performance ("track") of a specified basket of underlying investments. While index providers often emphasize that they are for-profit organizations, index providers have the ability to act as "reluctant regulators" when determining which companies are suitable for an index.

Extreme ultraviolet lithography

Extreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.

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