Publication

Dose dependence of luminescence increase in H2-loaded Bi-Al co-doped optical fibers by cw 244-nm and pulsed 193-nm laser irradiation

Hans Georg Limberger, Georgios Violakis
2013
Conference Papers

Abstract

The near infrared luminescence is increased in H2-loaded Bi-Al co-doped optical fibers by irradiation of cw 244-nm or pulsed 193-nm laser light. The dose dependence is different for the two lasers.

Official source

https://infoscience.epfl.ch/entities/publication/7309fb8c-9315-4a5d-8753-e108d44cebb4

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Hans Georg Limberger, Georgios Violakis
2013
Conference Papers

Abstract

The near infrared luminescence is increased in H2-loaded Bi-Al co-doped optical fibers by irradiation of cw 244-nm or pulsed 193-nm laser light. The dose dependence is different for the two lasers.

Official source

https://infoscience.epfl.ch/entities/publication/7309fb8c-9315-4a5d-8753-e108d44cebb4

About this result

Related concepts (7)

Excimer laser

An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining. Since 1960s excimer lasers are widely used in high-resolution photolithography machines, one of the critical technologies required for microelectronic chip manufacturing. The term excimer is short for 'excited dimer', while exciplex is short for 'excited complex'.

Laser

A laser is a device that emits light through a process of optical amplification based on the stimulated emission of electromagnetic radiation. The word laser is an anacronym that originated as an acronym for light amplification by stimulated emission of radiation. The first laser was built in 1960 by Theodore Maiman at Hughes Research Laboratories, based on theoretical work by Charles H. Townes and Arthur Leonard Schawlow. A laser differs from other sources of light in that it emits light that is coherent.

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A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research. The term excimer is short for 'excited dimer', while exciplex is short for 'excited complex'. An excimer laser typically contains a mixture of: a noble gas such as argon, krypton, or xenon; and a halogen gas such as fluorine or chlorine.

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