Publication

Complex nanostructures in PMMA made by a single process step using e-beam lithography

Nico de Rooij, Sebastian Gautsch, Michel Studer
2009
Conference Papers

Abstract

We present results on the single step fabrication of autocentered nanopillars with surrounding circular rim. This particular 3-dimensional shape is created by the energy density distribution of incident and backscattered electrons and reflects the dual behavior of PMMA as positive and negative e-beam resist. Structures with 80 nm rim diameter and 20 nm wide nanopillars could be realized. We could show that the characteristic dimensions of the structures can be varied almost independently by playing with the exposure parameters. Qualitative and quantitative analysis of the structure shapes are described and several fields of application are proposed.

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https://infoscience.epfl.ch/entities/publication/ab099208-d95a-4cf7-a5b7-5f42c6cfca76

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Nico de Rooij, Sebastian Gautsch, Michel Studer
2009
Conference Papers

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/ab099208-d95a-4cf7-a5b7-5f42c6cfca76

About this result

Related concepts (15)

Electron-beam lithography

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

Self-assembly of nanoparticles

Nanoparticles are classified as having at least one of three dimensions be in the range of 1-100 nm. The small size of nanoparticles allows them to have unique characteristics which may not be possible on the macro-scale. Self-assembly is the spontaneous organization of smaller subunits to form larger, well-organized patterns. For nanoparticles, this spontaneous assembly is a consequence of interactions between the particles aimed at achieving a thermodynamic equilibrium and reducing the system’s free energy.

Nanoimprint lithography

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

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