Publication

A novel carbon coating technique for foil bolometers

Basil Duval, Benoît Labit, Umar Sheikh, Federico Nespoli
2016
Conference Papers

Abstract

Naked foil bolometers can reflect a significant fraction of incident energy and therefore cannot be used for absolute measurements. This paper outlines a novel coating approach to address this problem by blackening the surface of gold foil bolometers using physical vapour deposition. An experimental bolometer was built containing four standard gold foil bolometers, of which two were coated with 100+ nm of carbon. All bolometers were collimated and observed the same relatively high temperature, ohmically heated plasma. Preliminary results showed 13%-15% more incident power was measured by the coated bolometers and this is expected to be much higher in future TCV detached divertor experiments.

Official source

https://infoscience.epfl.ch/entities/publication/b8606f88-c3bc-4a1d-a1e2-b2f1b9624696

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Basil Duval, Benoît Labit, Umar Sheikh, Federico Nespoli
2016
Conference Papers

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/b8606f88-c3bc-4a1d-a1e2-b2f1b9624696

About this result

Related concepts (14)

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

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