The surface morphology of MnSi thin films grown on Si(111)-7 x 7 substrates was investigated by systematically changing the amount of deposited Mn. A new 3 x 3 surface reconstruction was found at the very initial growth stages, whose atomic configuration was analyzed both experimentally and theoretically. At a coverage of 0.1 monolayers, the formation of nanometer-sized MnSi islands was observed in coexistence with Mn nanoclusters that fit within the 7 x 7 half unit cell. With increasing Mn deposition, the MnSi islands grow, develop extended flat tops and eventually coalesce into an atomically flat film with a high corrugated root 3x root 3 reconstruction punctuated by several holes. The successive film growth mode is characterized by the formation of MnSi quadlayers with a low corrugated root 3x root 3 reconstruction. (C) 2013 Elsevier B.V. All rights reserved.
Manuel Cordova, David Lyndon Emsley, Aditya Mishra, Michael Allan Hope, Ümmügülsüm Günes
Quentin Jean-Marie Armand Guesnay
Jun Ho Yum, Kevin Sivula, Linda Lazouni, Loï Charles Carbone, Benjamin Goldman, Rebekah Anne Wells, Simon Nussbaum, Marina Caroline Michèle Caretti, Elizaveta Potapova Mensi, Hannah Elizabeth Johnson, Emeline Cécile Rideau