Colloidal Particles: Stabilization and Characterization

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Related lectures (29)

Stabilization Mechanism of Colloidal Particles

Explores the stabilization mechanism of colloidal particles, emphasizing the importance of encapsulation for protection and controlled release.

Surface Characterization: X-ray Photoelectron Spectroscopy

Covers the principles and applications of X-ray Photoelectron Spectroscopy for surface characterization.

Film Thickness Determination: XPS Analysis

Explains film thickness determination using XPS and AES techniques, covering principles, instrumentation, and analytical comparisons.

Colloidal Stability and Hamaker Constant

Explores colloidal stability, Hamaker constant, and particle interactions in colloidal systems.

Surfactants and Micelles: Colloidal Stability

Explores the role of surfactants and micelles in achieving steric stability for ceramic production.

Ceramic Processing: Wetting and Dispersion

Explores wetting and dispersion of ceramic powders, surface tension, additives, and microstructure control.

Surface Analysis and SIMS

Explores surface analysis methods using electrons, ions, atoms, and photons, emphasizing the importance of ToF-SIMS for in-depth surface analysis in various fields.

Characterisation: Ceramics and Colloids

Explores ceramics and colloids characterisation, focusing on powder morphology, distributions, sieved powders, and particle size analysis methods.

Computational Quantum Physics

Covers exact diagonalization methods for many-particle systems in quantum physics.

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