Publications by Christoph Hollenstein

Multiple dehydrogenation reactions of negative ions in low pressure silane plasma chemistry

Christoph Hollenstein, Alan Howling, Antoine Descoeudres

Micro-particle formation in low pressure silane (SiH4) plasmas has been of technical interest and concern for at least 40 years. Negative ion plasma chemistry is a candidate for the initial nucleation, which has been extensively studied both experimentally ...

2020

OES Characterization of Steamers in a Nanosecond Pulsed SBDB Using N2 and Ar Transitions

Christoph Hollenstein, Pénélope Leyland, Peter Ott, Sami Goekce, Philip Peschke

The characterization of non-thermal homogeneous plasmas is possible using optical emission spectroscopy (OES), notably by estimating the reduced electric field. This method was applied to characterize streamers generated by a nanosecond pulsed surface diel ...

Iop Publishing Ltd2016

Industrial plasmas in academia

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling, Ivo Furno

The present review, written at the occasion of the 2014 EPS Innovation award, will give a short overview of the research and development of industrial plasmas within the last 30 years and will also provide a first glimpse into future developments of this i ...

Iop Publishing Ltd2015

Temporal characteristics of the pulsed electric discharges in small gaps filled with hydrocarbon oil

Christoph Hollenstein

In order to understand the role of electrode materials in electrical discharges with micro gaps (

Iop Publishing Ltd2015

Analysis of resonant planar dissipative network antennas for rf inductively coupled plasma sources

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling

The analysis of a radio-frequency (RF) planar antenna is presented for applications in plasma processing. The antenna is a network of elementary meshes composed of inductive and capacitive elements which exhibits a set of resonant modes. The high currents ...

Iop Publishing Ltd2014

Direct current breakdown in gases for complex geometries from high vacuum to atmospheric pressure

Christoph Hollenstein, Alan Howling, Ralph Schnyder

The demand for improved performances of power transmission devices requires ever smaller dimensions and higher working voltages which lead to increased risk of breakdown, for example, in satellite slip rings. Previous works are mostly limited to breakdown ...

Iop Publishing Ltd2013

Low ion energy RF reactor using an array of plasmas through a grounded grid

Christoph Hollenstein, Alan Howling, Michaël Chesaux

A reactor using localized remote plasma in a grid electrode is presented in this study. The aim is to reduce the ion bombardment energy inherent in RF capacitively coupled parallel plate reactors used to deposit large area thin film silicon solar cells. Hi ...

A V S Amer Inst Physics2013

Resonant RF network antennas for large-area and large-volume inductively coupled plasma sources

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling

Large-area and large-volume radio frequency (RF) plasmas are produced by different arrangements of an elementary electrical mesh consisting of two conductors interconnected by a capacitor at each end. The obtained cylindrical and planar RF networks are res ...

Iop Publishing Ltd2013

Funnelling of rf current via a plasmoid through a grid hole in an rf capacitive plasma reactor

Christoph Hollenstein, Alan Howling, Michaël Chesaux

The boundaries of capacitively coupled radio-frequency (rf) plasma reactors generally include at least one grounded metal grid or perforated plate for purposes of gas flow or diagnostic access. When increasing the rf power, an intense localized plasma (a p ...

Iop Publishing Ltd2013

Generation of Whistler-Wave Heated Discharges with Planar Resonant rf Networks

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling

Magnetized plasma discharges generated by a planar resonant rf network are investigated. A regime transition is observed above a magnetic field threshold, associated with rf waves propagating in the plasma and which present the characteristics of whistler ...

Amer Physical Soc2013

High Voltage Pulsed DBD Effects on the Aerodynamic Performances and on the Shock Buffet

Christoph Hollenstein, Pénélope Leyland, Peter Ott, Philip Peschke

The applications of surface dielectric barrier discharge plasma actuators, (DBD), have known a considerable interest recently in the field of flow control. In general, such actuators consist of two electrodes separated by an insulation covering the lower e ...

2013

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Christoph Hollenstein, Alan Howling, Michaël Chesaux, Boris Legradic

The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

Plasma generation by inductive coupling with a planar resonant RF network antenna

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling, Sylvain Lecoultre

A planar antenna operating at 13.56MHz is presented for potential applications in plasma processing. It consists of interconnected elementary resonant meshes composed of inductive and capacitive elements. Due to its structure, the antenna exhibits a set of ...

2012

Resonant planar antenna as an inductive plasma source

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling, Sylvain Lecoultre

A resonant planar antenna as an inductive plasma source operating at 13.56 MHz inside a low pressure vacuum vessel is presented for potential plasma processing applications. Its principle consists in interconnecting elementary resonant meshes composed of i ...

2012

Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes

Malko Gindrat, Philippe Frédérique Bruno Guittienne, Christoph Hollenstein

Conventional equipment for plasma spraying can be adapted for operation at low pressure so that PECVD-like processing can be performed. The plasma jet generated by the torch is characterized by a high convective velocity and a high gas temperature. The inf ...

Springer US2012

Plasma generation by inductive coupling with a planar resonant RF network antenna (vol 45, 082001, 2012)

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling, Sylvain Lecoultre

Iop Publishing Ltd2012

Plasma Spray-CVD: A New Thermal Spray Process to Produce Thin Films from Liquid or Gaseous Precursors

Malko Gindrat, Philippe Frédérique Bruno Guittienne, Christoph Hollenstein

New dedicated coating processes which are based on the well-known LPPS (TM) technology but operating at lower work pressure (100 Pa) are being actively developed. These hybrid technologies contribute to improve the efficiencies in the turbine industry such ...

2011

Influence of Argon and Nitrogen Admixture in HMDSO/O-2 Plasmas onto Powder Formation

Christoph Hollenstein, Marina Ricci

In situ Fourier transform infrared spectroscopy was used to study the powder formation of hexamethyldisiloxane/O-2 plasmas. The spectra show that oxygen plays an important role at the beginning of the process. A large amount of oxygen is responsible for in ...

2011

Input silane concentration effect on the a-Si:H to uc-Si:H transition width

Christophe Ballif, Christoph Hollenstein, Fanny Sculati-Meillaud, Benjamin Strahm, Andrea Feltrin, Grégory Bugnon

In this work the microstructure transition width from amorphous to microcrystalline silicon is discussed. It is shown that the width of the transition depends on the input silane concentration level and indirectly on the silane depletion level. The higher ...

2010

Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition

Christoph Hollenstein, Alan Howling, Raffaello Sobbia

Plasma conditions for microcrystalline silicon deposition generally require a high flux of atomic hydrogen, relative to SiH alpha=0 -> 3 radicals, on the growing film. The necessary dominant partial pressure of hydrogen in the plasma is conventionally obta ...

American Vacuum Society2010