Publications by Marc Antonius Friedrich van den Boogaart

Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wiley-Blackwell2009

Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

In this paper, we study the localized deposition of ZnO micro and nanostructures deposited by non-reactive rf-magnetron sputtering through a stencil mask on ultra-thin (10 nm) SiO2 layers containing a single plane of silicon nanocrystals (NCs), synthetized ...

2009

Full-wafer fabrication by nanostencil lithography of micro/nanomechanical mass sensors monolithically integrated with CMOS

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wafer-scale nanostencil lithography (nSL) is used to define several types of silicon mechanical resonators, whose dimensions range from 20 μm down to 200 nm, monolithically integrated with CMOS circuits. We demonstrate the simultaneous patterning by nSL of ...

2008

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Combining micelle self-assembly with nanostencil lithography to create periodic/aperiodic micro- /nanopatterns on surfaces

Cyrille Hibert, Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Sivashankar Krishnamoorthy

Wiley2008

Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

This paper addresses mask deformation phenomenon that frequently occurs but is highly undesirable in stencil lithography. Previously, a technique for mechanical stabilisation of stencils was proposed [M.A.F. van den Boogaart, et al., Corrugated membranes f ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Kristopher Pataky, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008

Sub-100 nm-scale Aluminum Nanowires by Stencil Lithography: Fabrication and Characterization

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is a ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Elsevier2008

Dynamic Stencil Lithography on Full Wafer Scale

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Dynamic stencil lithography on full wafer scale

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...

2008

KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Silicon nanoparticles synthesized in SiO2 pockets by stencil-masked low energy ion implantation and thermal annealing

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We propose an original approach called a "stencil-masked ion implantation process" for performing a spatially localized synthesis of a limited number of Si nanocrystals within a thin SiO2 layer. In this process, the SiO2 layer is irradiated with 1 keV sili ...

Elsevier2008

Controlled synthesis of silicon nanocrystals into a thin SiO2 layer synthesized by stencil-masked ultra-low energy ion implantation

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

2008

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Dry etching for the correction of gap-induced blurring and improved pattern resolution in nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We present nanostencil lithography as a new and parallel nanopatterning technique for batch fabrication of micro/ nanoelectromechanical systems (MEMS/NEMS) with high throughput and resolution. We use nanostencil lithography for the purpose of integrating n ...

2007

Nanostenciling for combinatorial fabrications and interconnections of nanopatterns and microelectrodes

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Sébastien Gauthier

Stencil lithography is used for patterning and connecting nanostructures with metallic microelectrodes in ultrahigh vacuum. Microelectrodes are fabricated by static stencil deposition through a thin silicon nitride membrane. Arbitrary nanoscale patterns ar ...

2007