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Oscar Vazquez Mena

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Publications associées (44)

Development of stencil lithography for nanopatterning and for electronic and biosensing applications

Oscar Vazquez Mena

This work presents analyses and developments in nanofabrication using stencil lithography and its application for electronics and biosensing. Metallic nanostructures are fabricated using stencil lithography studying the pattern transfer from the stencil to ...

EPFL2010

Fabrication of Metallic Nanodots by Stencil Lithography for Localized Surface Plasmon Resonance Biosensing

Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

2010

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

Nanoporous SiN membranes are interesting for a number of applications, e.g. stenciling, filtration, or tissue engineering [1-3]. The patterning of the pores requires a high resolution lithographic tool. Focused ion beam milling or e-beam lithography fulfil ...

2010

Direct Etching of High Aspect structures through a Stencil

Cyrille Hibert, Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

2009

Analysis and Applications of Nanostructures Created by Stencil Lithography

Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

2009

Analysis of the blurring in stencil lithography

Philippe Langlet, Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

A quantitative analysis of the blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structur ...

2009

Focused Ion Beam: A Versatile Technique for the Fabrication of Nano-Devices

Christian Santschi, Jürgen Brugger, Olivier Martin, Oscar Vazquez Mena

2009

Minimized Blurring in Stencil Lithography using a Compliant Membrane

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Luis Guillermo Villanueva Torrijo

2009

Stencilled Conducting Bismuth Nanowires

Jürgen Brugger, Sam Neuser, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2009

Nanostencil and InkJet Printing for Bionanotechnology Applications

Jürgen Brugger, Kristopher Pataky, Oscar Vazquez Mena

In this contribution we describe the application of Ink-Jet printing and Stencil Lithography in bionanotechnology. Both techniques are alternative patterning methods that can be used for the fabrication of biocompatible micro- and nanostructures out of the ...

2009

Direct fabrication of NIL stamps using Stencil Lithography

Jürgen Brugger, Oscar Vazquez Mena, Thomas Kiefer, Luis Guillermo Villanueva Torrijo

Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been ach ...

2008

Resistless ion implantation of sub-micron scale features through nano-stencil

Philippe Langlet, Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

Resistless ion implantation of sub-micron scale features through nano-stencil ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Kristopher Pataky, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008

Sub-100 nm-scale Aluminum Nanowires by Stencil Lithography: Fabrication and Characterization

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is a ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Elsevier2008

A single nanotrench in a palladium microwire for hydrogen detection

Jürgen Brugger, Oscar Vazquez Mena, Thomas Kiefer, Luis Guillermo Villanueva Torrijo

The hydrogen sensing characteristics of a single nanotrench fabricated by focused ion beam milling (FIB) in an evaporated palladium microwire are presented. In situ atomic force microscopy (AFM) measurements proved that, in the presence of H2, the trench c ...

2008

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Quick & Clean: Advances in High Resolution Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2007

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