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Andreea Veronica Savu

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Publications associées (56)

Ambipolar silicon nanowire FETs with stenciled-deposited metal gate

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Andreea Veronica Savu, Davide Sacchetto

We report on a fully CMOS compatible fabrication method for ambipolar silicon nanowire FinFETs. The low thermal budget processing, compatible with monolithic 3D device integration, makes use of low pressure chemical vapor deposition (LPCVD) of amorphous Si ...

Elsevier2011

The effects of channel length and film microstructure on the performance of pentacene transistors

Libero Zuppiroli, Jürgen Brugger, Katrin Sidler Arnet, Andreea Veronica Savu, Franziska Dora Fleischli

With the use of the stencil lithography, we fabricated pentacene thin-ﬁlm transistors pre- pared directly on thermally oxidized silicon gates with channel lengths ranging from 2 to 600 lm. By performing 4-probe measurements or by using the transfer line me ...

Elsevier2011

Vertically-Stacked Si Nanowire FETs with sub-micrometer Gate-All-Around polysilicon gates patterned by nanostencil lithography

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Michail Zervas, Andreea Veronica Savu, Davide Sacchetto, Shenqi Xie

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

The reliable and reproducible fabrication of nanostructures by stencil lithography faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures ...

2011

100 mm dynamic stencils pattern sub-micrometre structures

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

Dynamic stencil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. Sub-micrometre, two- dimensional patterning is demonstrated at full 100 mm wafer ...

2011

Organic Thin Film Transistors on Flexible Polyimide Substrates Fabricated by Full Wafer Stencil Lithography

Mihai Adrian Ionescu, Jürgen Brugger, Dimitrios Tsamados, Katrin Sidler Arnet, Andreea Veronica Savu, Nenad Cvetkovic

This paper presents new results on miniaturized organic thin film transistors (TFT) fabricated on a spin coated polyimide (PI) film. Patterning steps, that are vital for the integrity and electrical performances of the organic TFT, were performed using res ...

Elsevier2010

Flexible Membranes Improve Resolution in Stencil Lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2010

Ambipolar silicon nanowire FETs with stenciled sub-µm metal gate

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Andreea Veronica Savu, Davide Sacchetto

A fully CMOS compatible fabrication flow using low temperature a-Si LPCVD and stencil lithography has been developed and proved suitable for SiNW FinFETs having ambipolar conductance. The stencil mask has been demonstrated to be a real option for sub-micro ...

2010

Direct polymer patterning by high energy reactive ion beam through stencil masks

Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu

Polytetrafluoroethylene (PTFE) is a polymer with remarkable physico-chemical properties which has been used for membrane and biomedical applications [1]. This fluorpolymer is however difficult or cost- inhibiting to pattern with conventional methods with h ...

2010

Metallic Nanodot Arrays Fabricated by Stencil Lithography on SiO2 and Polymer Substrates

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2010

Stenciled conducting bismuth nanowires

Jürgen Brugger, Sam Neuser, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Stencil lithography is used here for the fabrication of bismuth nanowires using thermal evaporation. This technique provides good electrical contact resistance by having the nanowire structure and the contact pads deposited at the same time. It has also th ...

2010

Sputtering of (001)AlN thin films: Control of polarity by a seed layer

Jean-François Carlin, Paul Muralt, Denis Martin, Jürgen Brugger, Nicolas Grandjean, Evgeny Milyutin, Andreea Veronica Savu, Scott Harada

The authors report on the ability to control the polarity of sputter deposited AlN001 thin ﬁlms using seed layers. Reactive sputter deposition leads to N-polarity on any substrate hitherto applied, i.e., Si111, sapphire, SiO2, and polycrystalline metals su ...

American Vacuum Society2010

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

Nanoporous SiN membranes are interesting for a number of applications, e.g. stenciling, filtration, or tissue engineering [1-3]. The patterning of the pores requires a high resolution lithographic tool. Focused ion beam milling or e-beam lithography fulfil ...

2010

Three-level Stencil Alignment Fabrication of a High-k Gate Stack Organic Thin Film Transistor

Mihai Adrian Ionescu, Jürgen Brugger, Dimitrios Tsamados, Katrin Sidler Arnet, Andreea Veronica Savu, Nenad Cvetkovic

2010

Silicon nanowire AFM tips grown on released scanning probe cantilevers from stencil-deposited catalysts

Jürgen Brugger, Andreea Veronica Savu

We present a parallel, full wafer technique for deposition of catalyst on released scanning probe bodies for the growth of individual high aspect-ratio Si nanowire tips. 1-D probes are necessary for imaging high aspect-ratio nano-patterns, such as deep and ...

2010

Quick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctions

Jürgen Brugger, Andreea Veronica Savu

This paper presents a resist-less process for parallel fabrication of sub-micrometer Al-AlOx-Al superconducting tunnel junctions. A custom stencil is fabricated containing 200 nm low stress SiN membranes with micro-apertures. The stencil is aligned and cla ...

IEEE Institute of Electrical and Electronics Engineers2009

Analysis of the blurring in stencil lithography

Philippe Langlet, Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

A quantitative analysis of the blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structur ...

2009

Organic Thin Film Transistors on Flexible Polyimide Substrates Fabricated by Full Wafer Stencil Lithography

Mihai Adrian Ionescu, Jürgen Brugger, Dimitrios Tsamados, Katrin Sidler Arnet, Andreea Veronica Savu, Nenad Cvetkovic

Elsevier Science, Reg Sales Off, Customer Support Dept, 655 Ave Of The Americas, New York, Ny 10010 Usa2009

Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

In this paper, we study the localized deposition of ZnO micro and nanostructures deposited by non-reactive rf-magnetron sputtering through a stencil mask on ultra-thin (10 nm) SiO2 layers containing a single plane of silicon nanocrystals (NCs), synthetized ...

2009

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