Publications de Shenqi Xie | EPFL Graph Search

Shape Memory Micro- and Nanowire Libraries for the High-Throughput Investigation of Scaling Effects

Jürgen Brugger, Alfred Ludwig, Shenqi Xie

The scaling behavior of Ti-Ni-Cu shape memory thin-film micro-and nanowires of different geometry is investigated with respect to its influence on the martensitic transformation properties. Two processes for the high throughput fabrication of Ti-Ni-Cu micr ...

ACS Publications2017

Growth Of Organic Semiconductor Thin Films with Multi-Micron Domain Size and Fabrication of Organic Transistors Using a Stencil Nanosieve

Jürgen Brugger, Valentin Flauraud, Shenqi Xie

To grow small molecule semiconductor thin films with domain size larger than modern-day device sizes, we evaporate the material through a dense array of small apertures, called a stencil nanosieve. The aperture size of 0.5 μm results in low nucleation dens ...

Amer Chemical Soc2017

Arrays of Pentacene Single Crystals by Stencil Evaporation

Jürgen Brugger, Valentin Flauraud, Shenqi Xie

In order to realize high-performance organic thin-film transistors (TFT), two parameters of the organic semiconducting layer are desired: single crystallinity for high mobility and patterning for low off currents. High-quality single crystals can be fabric ...

2016

Hot Stencils : A New Path for Resistless Nanopatterning

Shenqi Xie

EPFL2013

Heated mask

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remov ...

2013

In-situ actuated gap reduction and clogging-free apertures for quasi-dynamic stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

We demonstrate a high-resolution implementation of quasi-dynamic stencil lithography based on the integration of a micro-hotplate on the stencil membrane. The stencil design has been tailored so that the thermally actuated membrane reduces the gap between ...

2012

Vertically-stacked gate-all-around polysilicon nanowire FETs with sub-μm gates patterned by nanostencil lithography

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Michail Zervas, Andreea Veronica Savu, Davide Sacchetto, Shenqi Xie

We report on the top-down fabrication of vertically-stacked polysilicon nanowire (NW) gate-all-around (GAA) field-effect-transistors (FET) by means of Inductively Coupled Plasma (ICP) etching and nanostencil lithography. The nanostencil is used to form sub ...

Elsevier2012

Thermal control extends heated stencil’s life-time

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

2012

Heated membranes prevent clogging of apertures in nanostencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

We demonstrate a novel concept for nanostencil lithography with an integrated microhotplate on the stencil membrane aimed at eliminating or reducing aperture clogging during metal deposition. The stencil can be locally heated up by the embedded Pt coils to ...

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

Vertically-Stacked Si Nanowire FETs with sub-micrometer Gate-All-Around polysilicon gates patterned by nanostencil lithography

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Michail Zervas, Andreea Veronica Savu, Davide Sacchetto, Shenqi Xie

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

100 mm dynamic stencils pattern sub-micrometre structures

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

Dynamic stencil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. Sub-micrometre, two- dimensional patterning is demonstrated at full 100 mm wafer ...

2011