Publications associées à Fault-Tolerant Multi-Level Logic Decoder for Nanoscale Crossbar Memory Arrays

Dual-frequency spectral radar retrieval of snowfall microphysics: a physics-driven deep-learning approach

Alexis Berne, Gionata Ghiggi, Anne-Claire Marie Billault--Roux

The use of meteorological radars to study snowfall microphysical properties and processes is well established, in particular via a few distinct techniques: the use of radar polarimetry, of multi-frequency radar measurements, and of the radar Doppler spectr ...

COPERNICUS GESELLSCHAFT MBH2023

Controlling motion at the nanoscale with light

Mintae Chung

Optical manipulation at the micro- nano-scale is a fascinating topic due to its inherent non-invasive properties and multifaceted applications in various fields such as biology, sensing, micro-fluidics, and micro- nano-robotics. This thesis involves intens ...

EPFL2022

A Low-Temperature Annealing Method for Alloy Nanostructures and Metasurfaces: Unlocking a Novel Degree of Freedom

Christian Santschi, Olivier Martin, Debdatta Ray, Jeonghyeon Kim, Hsiang-Chu Wang

The material and exact shape of a nanostructure determine its optical response, which is especially strong for plasmonic metals. Unfortunately, only a few plasmonic metals are available, which limits the spectral range where these strong optical effects ca ...

Wiley-V C H Verlag Gmbh2022

Fabrication and applications of AuAg alloy metasurfaces and hybrid metal dielectric nanoantennas

Debdatta Ray

The most prevalent materials used in the field of plasmonics are Au and Ag. However, for the past few years, the plasmonic community has also been looking for alternative materials that have lower losses than Au and higher stability than Ag. This thesis is ...

EPFL2021

Thermal scanning probe lithography-a review

Jürgen Brugger, Samuel Tobias Howell

Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in appl ...

2020

Electron Beam Induced Copper Deposition from Carboxylate Precursors and the Study of Underlying Growth Mechanisms

Luisa Berger

The fabrication of defined and high-quality metal nanostructures is an ongoing topic of research. Direct-write deposition of copper nanostructures is of great value for many fields of research and industrial applications. Focused electron beam induced depo ...

EPFL2020

Using an antenna as a tool for studying microturbulence and zonal structures in tokamaks with a global gyrokinetic GPU-enabled particle-in-cell code

Noé Thomas Elie Ohana

In order to get a better understanding of the interaction of plasma microinstabilities and associated turbulence with specific modes, an antenna is implemented in the global gyrokinetic Particle-In-Cell (PIC) code ORB5. It consists in applying an external ...

EPFL2020

Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints

Philippe Renaud, Harald Van Lintel, Shahin Bonakdar, Hanie Kavand

New cell-imprint surface modification techniques based on direct-cell photolithography and optical soft lithography using poly(dimethylsiloxane) (PDMS) cell imprints are presented for enhanced cell-based studies. The core concept of engineering materials f ...

AMER CHEMICAL SOC2019

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Wilfried Noell, Toralf Scharf, Chen Yan, Raoul Kirner, Andreas Vetter

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

Fabrication and Characterisation of Epitaxial PMN-PT Nano-structures

Xiao Di

Downscaling of the minimal feature size, or the gate length has been the key for the exponential im-provement of the performance of the logic CMOS integrated circuits over the last six decades. How-ever, since about 2003, some fundamental limits in the dev ...

EPFL2019

Nanoscale Lithography and Thermometry with Thermal Scanning Probes

Samuel Tobias Howell, Samuel Zimmermann

Thermal scanning probe lithography (t-SPL) is an advanced lithography technique in which a heated atomic force microscope tip locally modifies a sample material. Due to the nanometer-sized tip apex diameter, t-SPL enables patterning of sub-10 nm structures ...

EPFL2018

Mask-aligner Talbot lithography using a 193 nm CW light source

Wilfried Noell, Toralf Scharf, Raoul Kirner, Andreas Vetter

We present and discuss Talbot mask-aligner lithography, relying on a continuous wave laser emitting at 193nm for the illumination. In this source, a diode laser at 772nm is amplified by a tapered amplifier in master-oscillator power-amplifier configuration ...

2018

Improving the resolution in mask-aligner lithography

Wilfried Noell, Toralf Scharf, Raoul Kirner, Andreas Vetter

For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

IEEE2018

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Jürgen Brugger, Yuliya Lisunova

Thermal scanning probe lithography is an emerging nanofabrication technique for rapid prototyping of arbitrary topographies in thermally sensitive resist. This feature, paired to the recent advances in dry plasma etching techniques, allows the fabrication ...

Elsevier2017

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Krishnaparvathy Puthankovilakam

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Top-Down Technique for Scaling toNnano in Silicon MEMS

Yusuf Leblebici, Zuhal Tasdemir, Yasin Kilinc, Mustafa Yilmaz

Nanoscale building blocks impart added functionalities to microelectromechanical systems (MEMS). The integration of silicon nanowires with MEMS-based sensors leading to miniaturization with improved sensitivity and higher noise immunity is one example high ...

American Vacuum Society2017

Novel manufacturing methods for optical antennas : controlling light down to the single nanometer scale

Valentin Flauraud

The resonant excitation of free electrons in metallic nanostructures enables extreme near field intensities along with a deep sub-wavelength localization of the electromagnetic energy. This has been exploited to enhance light-matter interaction down to the ...

EPFL2017

Near-Memory Address Translation

Javier Picorel Obando

Virtual memory (VM) is a crucial abstraction in modern computer systems at any scale, from handheld devices to datacenters. VM provides programmers the illusion of an always sufficiently large and linear memory, making programming easier. Although the core ...

EPFL2017

Coherence management in lithography printing systems

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016