Publications by Andreea Veronica Savu

Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

Paul Muralt, Estelle Wagner, Giacomo Benvenuti, Silviu Cosmin Sandu, Andreea Veronica Savu, Scott Harada

Chemical Beam Vapour Deposition is a gas phase deposition technique, operated under high vacuum conditions, in which evaporated chemical precursors are thermally decomposed on heated substrates to form a film. In the particular equipment used in this work, ...

Elsevier2015

Grazing angle X-ray fluorescence from periodic structures on silicon and silica surfaces

Andreea Veronica Savu, Wei Cao

Various 3-dimensional nano-scaled periodic structures with different configurations and periods deposited on the surface of silicon and silica substrates were investigated by means of the grazing incidence and grazing emission X-ray fluorescence techniques ...

Pergamon-Elsevier Science Ltd2014

Heated mask

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remov ...

2013

Stencil-Nanopatterned Back Reflectors for Thin-Film Amorphous Silicon n-i-p Solar Cells

Christophe Ballif, Céline Pahud, Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franz-Josef Haug

We fabricated amorphous silicon n-i-p solar cells with two types of nanopatterned back reflectors using stencil lithography. One reflector type has a plasmonic grating that is embedded in the ZnO layer; the other one has a metallic grating patterned on top ...

Ieee-Inst Electrical Electronics Engineers Inc2013

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Application of stencil masks for ion beam lithographic patterning

Jürgen Brugger, Andreea Veronica Savu

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013

In-situ actuated gap reduction and clogging-free apertures for quasi-dynamic stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

We demonstrate a high-resolution implementation of quasi-dynamic stencil lithography based on the integration of a micro-hotplate on the stencil membrane. The stencil design has been tailored so that the thermally actuated membrane reduces the gap between ...

2012

Streched organic transistors maintain mobility on flexible substrates

Mihai Adrian Ionescu, Jürgen Brugger, Dimitrios Tsamados, Katrin Sidler Arnet, Andreea Veronica Savu, Nenad Cvetkovic

Two levels of aligned stencil lithography were used to fabricate pentacene thin film transistors on 12 mu m thick flexible polyimide substrates. Flexible transistors with 20 x 40 mu m(2) channels were electrically measured under strain up to 2.6%. After on ...

Elsevier2012

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

This work reports on a considerable resolution improvement of micro/nanostencil lithography when applied on full-wafer scale by using compliant membranes to reduce gap-induced pattern blurring. Silicon nitride (SiN) membranes are mechanically decoupled fro ...

2012

Organic half-wave rectifier fabricated by stencil lithography on flexible substrate

Mihai Adrian Ionescu, Jürgen Brugger, Dimitrios Tsamados, Katrin Sidler Arnet, Andreea Veronica Savu, Nenad Cvetkovic

Elsevier2012

Stencil-nanopatterned back reflectors for thin-film amorphous silicon n-i-p solar cells

Christophe Ballif, Céline Pahud, Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franz-Josef Haug

We fabricated amorphous silicon n-i-p solar cells with two types of nanopatterned back reflectors using stencil lithography. One reflector type has a plasmonic grating that is embedded in the ZnO layer; the other one has a metallic grating patterned on top ...

Ieee2012

Vertically-stacked gate-all-around polysilicon nanowire FETs with sub-μm gates patterned by nanostencil lithography

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Michail Zervas, Andreea Veronica Savu, Davide Sacchetto, Shenqi Xie

We report on the top-down fabrication of vertically-stacked polysilicon nanowire (NW) gate-all-around (GAA) field-effect-transistors (FET) by means of Inductively Coupled Plasma (ICP) etching and nanostencil lithography. The nanostencil is used to form sub ...

Elsevier2012

High-Resolution Resistless Nanopatterning on Polymer and Flexible Substrates for Plasmonic Biosensing Using Stencil Masks

Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo, Mahmut Tosun

The development of nanoscale lithographic methods on polymer materials is a key requirement to improve the spatial resolution and performance of flexible devices. Here, we report the fabrication of metallic nanostructures down to 20 and 50 nm in size on po ...

American Chemical Society2012

All-stencil transistor fabrication on 3D silicon substrates

Philippe Langlet, Cyrille Hibert, Peter Vettiger, Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been propo ...

Iop Publishing Ltd2012

Thermal control extends heated stencil’s life-time

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

2012

Heated membranes prevent clogging of apertures in nanostencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

We demonstrate a novel concept for nanostencil lithography with an integrated microhotplate on the stencil membrane aimed at eliminating or reducing aperture clogging during metal deposition. The stencil can be locally heated up by the embedded Pt coils to ...

2011

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Nicolas Blondiaux, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or 5 ...

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization

Jürgen Brugger, Nicolas Blondiaux, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franck Montagne, Vaida Auzelyte, Songmei Wu

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

Research Publishing Services2011

Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization

Jürgen Brugger, Nicolas Blondiaux, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne, Vaida Auzelyte, Songmei Wu

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

2011