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Christoph Hollenstein

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Publications associées (58)

Powder formation in SiH[sub 4]–H[sub 2] discharge in large area capacitively coupled reactors: A study of the combined effect of interelectrode distance and pressure

Christoph Hollenstein, Benjamin Strahm

One of the main challenges for silicon thin film deposition for solar cell applications is to achieve high rate deposition in order to reduce the manufacturing costs. However, when silane and hydrogen are used as precursor gas in parallel plate plasma-enha ...

American Institute of Physics2010

Radio frequency breakdown between structured parallel plate electrodes with a millimetric gap in low pressure gases

Christoph Hollenstein, Alan Howling, Boris Legradic

This paper presents an investigation into radio frequency (rf) breakdown for electrodes with holes or protrusions, approximating the situation in real reactors and providing a benchmark for fluid simulations. rf breakdown curves (voltage versus pressure) g ...

American Institute of Physics2010

Study of the microstructure transition width from amorphous to microcrystalline silicon as a function of the input silane concentration

Christophe Ballif, Christoph Hollenstein, Benjamin Strahm, Andrea Feltrin, Grégory Bugnon

Amorphous and microcrystalline silicon have been proven to be very interesting for low cost thin film photovoltaic devices. Usually these two materials are deposited using the same large area plasma-enhanced chemical vapor deposition reactors from silane a ...

2009

Effects of a surface dielectric barrier discharge on transonic flows around an airfoil

Christoph Hollenstein, Pénélope Leyland, Peter Ott, Samantha Pavon

2009

Mechanisms of films and coatings formation from gaseous and liquid precursors with low pressure plasma spray equipment

Malko Gindrat, Philippe Frédérique Bruno Guittienne, Christoph Hollenstein

Plasma spraying is a well developed and widely used technology, successfully applied for ceramic and metal coatings in many fields of applications such as aeronautics, gas turbine, automotive or medical. The coatings obtained are usually intentionally poro ...

Elsevier2009

Non-intrusive plasma diagnostics for the deposition of large area thin film silicon

Christoph Hollenstein, Alan Howling, Benjamin Strahm

Plasma diagnostics for large area, industrial RF parallel-plate reactors can be useful for process optimization and monitoring, provided that their implementation is practical and non-intrusive. For instance, Fourier transform infrared (FTIR) absorption sp ...

Elsevier2009

Time- and spatially-resolved characterization of electrical discharge machining plasma

Christoph Hollenstein, Ricardo Pérez Suárez, Antoine Descoeudres

2008

Uniformity of silicon microcrystallinity in large area RF capacitive reactors

Christoph Hollenstein, Alan Howling, Benjamin Strahm

2008

Micro-plasma formation during opening of a low current electrical contact

Christoph Hollenstein

2008

Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm

In this work, the microstructure transition from amorphous to microcrystalline silicon is defined in terms of the silane concentration in the plasma as opposed to the silane concentration in the input gas flow. In situ Fourier transform infrared absorption ...

2007

Effects of high-speed airflows on a surface dielectric barrier discharge

Christoph Hollenstein, Pénélope Leyland, Peter Ott, Samantha Pavon

A detailed study of the interaction between high-speed gas flows and surface dielectric barrier discharges (DBD) is presented. In the present paper, it is demonstrated that a DBD can be sustained in transonic airflows, up to isentropic Mach numbers of 1.1. ...

2007

Optimization of microcrystaline silicon deposition efficiency

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm

2007

Electromagnetic sources of nonuniformity in large area capacitive reactors

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling

Theory and experiment show that two electromagnetic modes are necessary and sufficient to determine the field nonuniformity within a parallel-plate rf capacitive plasma reactor. These two modes give rise to the standing wave effect and the telegraph effect ...

2007

(Strongly coupled) micro-plasma formation during opening of a low current electrical contact

Christoph Hollenstein

2007

Fast equilibration of silane/hydrogen plasmas in large area RF capacitive reactors monitored by optical emission spectroscopy

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm

The optimal plasma parameters for plasma processing, such as deposition of microcrystalline silicon from silane and hydrogen, are generally chosen in steady-state discharge conditions. However, this steady state must be reached in a short time after plasma ...

2007

Optimization of the microcrystalline silicon deposition efficiency

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm

Cost reduction constraints for microcrystalline silicon thin film photovoltaic solar cells require high deposition rates and high silane gas utilization efficiencies. If the requirements in deposition rate have sometimes been fulfilled, it is generally not ...

2007

Plasma diagnostics as a tool for process optimization

Christoph Hollenstein, Alan Howling, Benjamin Strahm

2007

Time- and spatially-resolved characterization of electrical discharge machining plasma (Invited lecture)

Christoph Hollenstein, Ricardo Pérez Suárez, Antoine Descoeudres

2007

In-situ process monitoring for plasma synthesis of alumina nanoparticles

Christoph Hollenstein

2006

Electromagnetic field nonuniformities in large area, high-frequency capacitive plasma reactors, including electrode asymmetry effects

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling

Electromagnetic wave propagation effects can give rise to important limitations for processing uniformity in large area, radio-frequency (rf) capacitive plasma reactors. The electromagnetic wavefield solution is derived for a capacitive, high-frequency, cy ...

2006

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