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Christoph Hollenstein

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Publications associées (58)

Experimental characterization of electrical discharge machining plasmas

Christoph Hollenstein, Ricardo Pérez Suárez, Antoine Descoeudres

2006

The influence of process parameters on precursor evaporation for alumina nanopowder synthesis in an inductively coupled rf thermal plasma

Christoph Hollenstein, Jong-Won Shin

The process parameters of an inductively coupled thermal plasma used for nanopowder synthesis are experimentally investigated using various plasma diagnostics and in situ powder monitoring methods. An enthalpy probe technique is applied to characterize the ...

2006

Effect of transonic airflows on a dielectric barrier discharge

Christoph Hollenstein, Pénélope Leyland, Peter Ott, Samantha Pavon

2006

Atmospheric and sub-atmospheric dielectric barrier discharges in helium and nitrogen

Christoph Hollenstein, Alban Sublet

Dielectric barrier discharges (DBDs) are investigated in helium and nitrogen as a function of pressure from 5 to 1000 mbar. Different regimes are observed: glow, Townsend, multi-peak and filamentary, depending on pressure, power and electrode gap. In heliu ...

2006

Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Hannes Schmidt

The electromagnetic standing wave effect can become the main source of nonuniformity limiting the use of very high frequency in large area reactors exceeding 1 m(2) required for industrial applications. Recently, it has been proposed and shown experimental ...

2006

Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm, Cédric Bucher

2006

High-rate large-area silicon deposition by VHF plasma

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Arvind Shah

2005

Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonuniformity

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Hannes Schmidt

2005

Comment on "Ion energy uniformity in high-frequency capacitive discharges" [Appl. Phys. Lett. 86, 021501 (2005)]

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Hannes Schmidt

2005

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: the telegraph effect

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Lukas Derendinger, Hannes Schmidt

In large-area radio-frequency (rf) capacitive reactors, the redistribution of rf current to maintain current continuity near asymmetric sidewalls causes a perturbation in rf plasma potential to propagate along the resistive plasma between capacitive sheath ...

2005

Towards an optimal antenna for helicon waves excitation

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein

Helicon sources are known to produce high-density plasmas and have found many applications. Different types of antenna have been used for helicon excitation but none of them generate a radio-frequency (rf) field that matches the helicon wave field determin ...

2005

Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Lukas Derendinger, Benjamin Strahm

In large area reactors, a local asymmetry of the electrode area, due to lateral grounded walls, causes a perturbation in rf plasma potential, due to the redistribution of lateral rf current, which propagates along the resistive plasma between capacitive sh ...

2005

Time-resolved imaging and spatially-resolved spectroscopy of electrical discharge machining plasma

Christoph Hollenstein, Ricardo Pérez Suárez, Antoine Descoeudres

The plasma created during electrical discharge machining is investigated with imaging and spatially-resolved optical emission spectroscopy. Analysis of the pre-breakdown duration shows that the breakdown is of stochastic nature. Due to the presence of gas ...

2005

Sub-atmospheric pressure barrier discharge for siox deposition: plasma diagnostics and coating characterization

Christoph Hollenstein, Alban Sublet

2005

Inclusion of aerodynamic non-equilibrium effects in supersonic plasma jet enthalpy probe measurements

Malko Gindrat, Christoph Hollenstein

Low pressure plasma spraying (LPPS) is a thermal spraying technique that has found a niche for low oxidation products. It uses a low pressure environment (i.e:, chamber pressure between 2 and 90 kPa) and yields supersonic plasma jets. The enthalpy probe te ...

2005

Fluoropolymer coating of medical grade poly(vinyl chloride) by plasma-enhanced chemical vapor deposition techniques

Christoph Hollenstein

Medical grade poly(vinyl chloride) was modified by RF plasma-deposition of teflon-like coatings to create a platform for the physisorption of PEO-containing copolymers, Pluronics (R). Thin teflon-like coatings were deposited in an RF-plasma reactor by plas ...

2005

High Efficiency p-i-n a-Si:H Solar Cells with Low Boron Cross-Contamination Prepared in a Large Area Single-Chamber PECVD Reactor

Stefano Benagli, Christoph Hollenstein, Alan Howling, Arvind Shah, Juliette Ballutaud, Cédric Bucher

In this work, a new type of short water vapor treatment of the interface between the p- and i-layer is presented. This novel treatment is performed under vacuum below 1 mbar for 5 min and considerably reduces the i-layer boron contamination in amorphous si ...

2004

Study of gas ionization schemes for micro devices

Christoph Hollenstein, Philippe Renaud, Harald Van Lintel

For the development of micro gas sensors, studies of field ionization and break-down in small gaps were performed. A finite element simulation was done for an estimate of the achievable field strength near a nanotube tip in small gaps. The simulation also ...

2001

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