Publications de Oscar Vazquez Mena

Resistless nanofabrication by stencil lithography: A review

Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

We present a review on stencil lithography and focus on the particular interest and challenges when applying it to the scalable fabrication of nm-size devices. We first describe the basic technique with its main advantages and challenges. Then we review th ...

Elsevier2015

Stencil-Nanopatterned Back Reflectors for Thin-Film Amorphous Silicon n-i-p Solar Cells

Christophe Ballif, Céline Pahud, Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franz-Josef Haug

We fabricated amorphous silicon n-i-p solar cells with two types of nanopatterned back reflectors using stencil lithography. One reflector type has a plasmonic grating that is embedded in the ZnO layer; the other one has a metallic grating patterned on top ...

Ieee-Inst Electrical Electronics Engineers Inc2013

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Facile fabrication of nanofluidic diode membranes using anodic aluminium oxide

Philippe Renaud, Arnaud Bertsch, Jürgen Brugger, Fabien Patrick Wildhaber, Oscar Vazquez Mena, Songmei Wu

Active control of ion transport plays important roles in chemical and biological analytical processes. Nanofluidic systems hold the promise for such control through electrostatic interaction between ions and channel surfaces. Most existing experiments rely ...

Royal Soc Chemistry2012

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

This work reports on a considerable resolution improvement of micro/nanostencil lithography when applied on full-wafer scale by using compliant membranes to reduce gap-induced pattern blurring. Silicon nitride (SiN) membranes are mechanically decoupled fro ...

2012

Stencil-nanopatterned back reflectors for thin-film amorphous silicon n-i-p solar cells

Christophe Ballif, Céline Pahud, Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franz-Josef Haug

We fabricated amorphous silicon n-i-p solar cells with two types of nanopatterned back reflectors using stencil lithography. One reflector type has a plasmonic grating that is embedded in the ZnO layer; the other one has a metallic grating patterned on top ...

Ieee2012

High-Resolution Resistless Nanopatterning on Polymer and Flexible Substrates for Plasmonic Biosensing Using Stencil Masks

Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo, Mahmut Tosun

The development of nanoscale lithographic methods on polymer materials is a key requirement to improve the spatial resolution and performance of flexible devices. Here, we report the fabrication of metallic nanostructures down to 20 and 50 nm in size on po ...

American Chemical Society2012

All-stencil transistor fabrication on 3D silicon substrates

Philippe Langlet, Cyrille Hibert, Peter Vettiger, Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been propo ...

Iop Publishing Ltd2012

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Nicolas Blondiaux, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or 5 ...

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization

Jürgen Brugger, Nicolas Blondiaux, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franck Montagne, Vaida Auzelyte, Songmei Wu

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

Research Publishing Services2011

Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization

Jürgen Brugger, Nicolas Blondiaux, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne, Vaida Auzelyte, Songmei Wu

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

2011

Localized Ion Implantation Through Micro/Nanostencil Masks

Philippe Langlet, Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

A method is presented that allows the deﬁnition of micrometer- and submicrometer-sized implanted structures in silicon without using photoresist patterning. The process is based on the use of stencils as masks in a conventional ion implanter, and is tested ...

Institute of Electrical and Electronics Engineers2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

The reliable and reproducible fabrication of nanostructures by stencil lithography faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures ...

2011

Metallic Nanodot Arrays by Stencil Lithography for Plasmonic Biosensing Applications

Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50−200 nm wide nanodots with different spacing of 50−300 nm are fabricated without any ...

American Chemical Society2011

Direct polymer patterning by high energy reactive ion beam through stencil masks

Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu

Polytetrafluoroethylene (PTFE) is a polymer with remarkable physico-chemical properties which has been used for membrane and biomedical applications [1]. This fluorpolymer is however difficult or cost- inhibiting to pattern with conventional methods with h ...

2010

Flexible Membranes Improve Resolution in Stencil Lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2010

Metallic Nanodot Arrays Fabricated by Stencil Lithography on SiO2 and Polymer Substrates

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2010

Stenciled conducting bismuth nanowires

Jürgen Brugger, Sam Neuser, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Stencil lithography is used here for the fabrication of bismuth nanowires using thermal evaporation. This technique provides good electrical contact resistance by having the nanowire structure and the contact pads deposited at the same time. It has also th ...

2010